a type of photoresist, typically used in deep ultraviolet (DUV) lithography, that relies on the catalytic action of a photogenerated acid during the post-exposure bake (PEB) process to alter the solubility of the exposed film. Since the acid catalyst is not consumed during PEB reaction, it can participate in multiple reaction cycles, thus providing an amplification mechanism. [SEMATECH] Also see chemical amplification.
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