1 : image mask used in conjunction with E-beam exposure tools; generally of two types: stencil, which is used with proximity E-beam and cell projection tools, and scatterer, which is used with projection E-beam tools (for example, SCALPEL). [SEMATECH] 2 : a photomask produced on an E-beam mask writer to differentiate from a mask produced with other tools. [SEMATECH]
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